Adiabatic plasma buncher

M. Ferrario; T. C. Katsouleas; L. Serafini; Ilan Ben Zvi

doi:10.1109/27.893295

Adiabatic plasma buncher

M. Ferrario
, T. C. Katsouleas
, L. Serafini
, Ilan Ben Zvi

Physics and Astronomy

National Institute for Nuclear Physics
University of Southern California

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

In this paper, we present a new scheme of injection into a plasma accelerator, aimed at producing a high-quality beam while relaxing the demands on the bunch length of the injected beam. The beam dynamics in the injector, consisting of a high-voltage pulsed photodiode, is analyzed and optimized to produce a λ_p/20 long electron bunch at 2.5 MeV. This bunch is injected into a plasma wave in which it compresses down to λ_p/100, while accelerating up to 250 MeV. This simultaneous bunching and acceleration of a high-quality beam requires a proper combination of injection energy and injection phase. Preliminary results from simulations are shown to assess the potentials of the scheme.

Original language	English
Pages (from-to)	1152-1158
Number of pages	7
Journal	IEEE Transactions on Plasma Science
Volume	28
Issue number	4
DOIs	https://doi.org/10.1109/27.893295
State	Published - Aug 2000

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abstract = "In this paper, we present a new scheme of injection into a plasma accelerator, aimed at producing a high-quality beam while relaxing the demands on the bunch length of the injected beam. The beam dynamics in the injector, consisting of a high-voltage pulsed photodiode, is analyzed and optimized to produce a λp/20 long electron bunch at 2.5 MeV. This bunch is injected into a plasma wave in which it compresses down to λp/100, while accelerating up to 250 MeV. This simultaneous bunching and acceleration of a high-quality beam requires a proper combination of injection energy and injection phase. Preliminary results from simulations are shown to assess the potentials of the scheme.",

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AU - Katsouleas, T. C.

AU - Serafini, L.

AU - Zvi, Ilan Ben

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N2 - In this paper, we present a new scheme of injection into a plasma accelerator, aimed at producing a high-quality beam while relaxing the demands on the bunch length of the injected beam. The beam dynamics in the injector, consisting of a high-voltage pulsed photodiode, is analyzed and optimized to produce a λp/20 long electron bunch at 2.5 MeV. This bunch is injected into a plasma wave in which it compresses down to λp/100, while accelerating up to 250 MeV. This simultaneous bunching and acceleration of a high-quality beam requires a proper combination of injection energy and injection phase. Preliminary results from simulations are shown to assess the potentials of the scheme.

AB - In this paper, we present a new scheme of injection into a plasma accelerator, aimed at producing a high-quality beam while relaxing the demands on the bunch length of the injected beam. The beam dynamics in the injector, consisting of a high-voltage pulsed photodiode, is analyzed and optimized to produce a λp/20 long electron bunch at 2.5 MeV. This bunch is injected into a plasma wave in which it compresses down to λp/100, while accelerating up to 250 MeV. This simultaneous bunching and acceleration of a high-quality beam requires a proper combination of injection energy and injection phase. Preliminary results from simulations are shown to assess the potentials of the scheme.

UR - https://www.scopus.com/pages/publications/0034239947

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DO - 10.1109/27.893295

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JF - IEEE Transactions on Plasma Science

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Adiabatic plasma buncher

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