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BEOL Compatible Ultra-Low Operating Voltage (0.5 V) and Preconfigured Switching Polarization States in Effective 3 nm Ferroelectric HZO Capacitors

  • Minjong Lee
  • , Jin Hyun Kim
  • , Dan N. Le
  • , Seojun Lee
  • , Si Un Song
  • , Rino Choi
  • , Youngbae Ahn
  • , Seung Wook Ryu
  • , Pil Ryung Cha
  • , Chang Yong Nam
  • , Seongbin Park
  • , Jongmug Kang
  • , Si Joon Kim
  • , Jiyoung Kim
  • University of Texas at Dallas
  • Inha University
  • Sk Hynix Inc. R&d
  • Kookmin University
  • Kangwon National University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

19 Scopus citations

Abstract

We report the record-high remanent polarization value (2Pr 55 μC/cm2) at an ultra-low operating voltage (0.5 V) with effective 3 nm hafnium zirconium oxide (HZO) capacitors. This exceptional ferroelectric property is achieved at a back-end-of-line (BEOL) compatible temperature below 400°C. Moreover, our devices demonstrate configurable ferroelectric saturation characteristics, ensuring reliable and reproducible switching polarization states (Psw). These results potentially allow the design of novel ferroelectric device circuitry. This study highlights the feasibility of extremely low-power ferroelectric applications beyond 0.5 V operation in BEOL.

Original languageEnglish
Title of host publication2024 IEEE Symposium on VLSI Technology and Circuits, VLSI Technology and Circuits 2024
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350361469
DOIs
StatePublished - 2024
Event2024 IEEE Symposium on VLSI Technology and Circuits, VLSI Technology and Circuits 2024 - Honolulu, United States
Duration: Jun 16 2024Jun 20 2024

Publication series

NameDigest of Technical Papers - Symposium on VLSI Technology
ISSN (Print)0743-1562

Conference

Conference2024 IEEE Symposium on VLSI Technology and Circuits, VLSI Technology and Circuits 2024
Country/TerritoryUnited States
CityHonolulu
Period06/16/2406/20/24

Keywords

  • BEOL compatibility
  • configurable states
  • effective 3 nm HZO
  • reliability
  • ultra-low voltage

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