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Bulk growth of large area SiC crystals

  • A. R. Powell
  • , J. J. Sumakeris
  • , Y. Khlebnikov
  • , M. J. Paisley
  • , R. T. Leonard
  • , E. Deyneka
  • , S. Gangwal
  • , J. Ambati
  • , V. Tsevtkov
  • , J. Seaman
  • , A. McClure
  • , C. Horton
  • , O. Kramarenko
  • , V. Sakhalkar
  • , M. O’Loughlin
  • , A. A. Burk
  • , J. Q. Guo
  • , M. Dudley
  • , E. Balkas
  • Wolfspeed, Inc.
  • Stony Brook University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

81 Scopus citations

Abstract

The growth of large diameter silicon carbide (SiC) crystals produced by the physical vapor transport (PVT) method is outlined. Methods to increase the crystal diameters, and to turn these large diameter crystals into substrates that are ready for the epitaxial growth of SiC or other non homogeneous epitaxial layers are discussed. We review the present status of 150 mm and 200 mm substrate quality at Cree, Inc. in terms of crystallinity, dislocation density as well as the final substrate surface quality.

Original languageEnglish
Title of host publicationSilicon Carbide and Related Materials 2015
EditorsFabrizio Roccaforte, Filippo Giannazzo, Francesco La Via, Roberta Nipoti, Danilo Crippa, Mario Saggio
PublisherTrans Tech Publications Ltd
Pages5-10
Number of pages6
ISBN (Print)9783035710427
DOIs
StatePublished - 2016
Event16th International Conference on Silicon Carbide and Related Materials, ICSCRM 2015 - Sicily, Italy
Duration: Oct 4 2015Oct 9 2015

Publication series

NameMaterials Science Forum
Volume858
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Conference

Conference16th International Conference on Silicon Carbide and Related Materials, ICSCRM 2015
Country/TerritoryItaly
CitySicily
Period10/4/1510/9/15

Keywords

  • 200mm
  • Dislocations
  • PVT
  • SiC bulk growth
  • Single crystal
  • Substrate manufacture

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