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Crystal orientation dependence of silicon doping in molecular beam epitaxial AlGaAs/GaAs heterostructures

  • IBM

Research output: Contribution to journalArticlepeer-review

229 Scopus citations

Abstract

Results on crystal orientation dependence of n- and p-type Si doping in molecular beam epitaxial GaAs are presented. High electron and hole mobilities in AlGaAs/GaAs heterostructures on high index planes are demonstrated for the first time. The doping results should prove useful for various transistor structures and complementary circuits. Also, due to the differences in the band structure for different orientations, quantum well heterostructures are likely to exhibit many interesting phenomena which are strongly orientation dependent.

Original languageEnglish
Pages (from-to)826-828
Number of pages3
JournalApplied Physics Letters
Volume47
Issue number8
DOIs
StatePublished - 1985

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