Depth and time dependence of polystyrene chain diffusion near the polystyrene/silicon interface

Y. Strzhemechny; V. Shapovalov; K. G. Zhou; S. A. Schwarz; J. Sokolov; M. H. Rafailovich

Depth and time dependence of polystyrene chain diffusion near the polystyrene/silicon interface

Y. Strzhemechny
, V. Shapovalov
, K. G. Zhou
, S. A. Schwarz
, J. Sokolov
, M. H. Rafailovich

Materials Science and Engineering

City University of New York
Stony Brook University

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

We report on the results for the diffusion coefficient (D^*) of polystyrene (PS) chains near the PS/Silicon interface. The present study employs secondary ion mass spectrometry (SIMS) to examine diffusion from a deuterated marker layer in thin PS films on silicon. The observed SIMS depth profiles are fit to numerical simulations of the diffusion process. The best fit is obtained for a super-linear dependence of D^* vs. distance from the silicon wall. A non-trivial time dependence extending over tens of hours is observed for all the models tested.

Original language	English
Pages (from-to)	151-156
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	543
State	Published - 1999
Event	Proceedings of the 1998 MRS Fall Meeting - The Symposium 'Advanced Catalytic Materials-1998' - Boston, MA, USA Duration: Nov 30 1998 → Dec 3 1998

Cite this

@article{b01741054da54143812ec3bdf05ab07f,

title = "Depth and time dependence of polystyrene chain diffusion near the polystyrene/silicon interface",

abstract = "We report on the results for the diffusion coefficient (D*) of polystyrene (PS) chains near the PS/Silicon interface. The present study employs secondary ion mass spectrometry (SIMS) to examine diffusion from a deuterated marker layer in thin PS films on silicon. The observed SIMS depth profiles are fit to numerical simulations of the diffusion process. The best fit is obtained for a super-linear dependence of D* vs. distance from the silicon wall. A non-trivial time dependence extending over tens of hours is observed for all the models tested.",

author = "Y. Strzhemechny and V. Shapovalov and Zhou, \{K. G.\} and Schwarz, \{S. A.\} and J. Sokolov and Rafailovich, \{M. H.\}",

year = "1999",

language = "English",

volume = "543",

pages = "151--156",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

note = "Proceedings of the 1998 MRS Fall Meeting - The Symposium 'Advanced Catalytic Materials-1998' ; Conference date: 30-11-1998 Through 03-12-1998",

}

TY - JOUR

T1 - Depth and time dependence of polystyrene chain diffusion near the polystyrene/silicon interface

AU - Strzhemechny, Y.

AU - Shapovalov, V.

AU - Zhou, K. G.

AU - Schwarz, S. A.

AU - Sokolov, J.

AU - Rafailovich, M. H.

PY - 1999

Y1 - 1999

N2 - We report on the results for the diffusion coefficient (D*) of polystyrene (PS) chains near the PS/Silicon interface. The present study employs secondary ion mass spectrometry (SIMS) to examine diffusion from a deuterated marker layer in thin PS films on silicon. The observed SIMS depth profiles are fit to numerical simulations of the diffusion process. The best fit is obtained for a super-linear dependence of D* vs. distance from the silicon wall. A non-trivial time dependence extending over tens of hours is observed for all the models tested.

AB - We report on the results for the diffusion coefficient (D*) of polystyrene (PS) chains near the PS/Silicon interface. The present study employs secondary ion mass spectrometry (SIMS) to examine diffusion from a deuterated marker layer in thin PS films on silicon. The observed SIMS depth profiles are fit to numerical simulations of the diffusion process. The best fit is obtained for a super-linear dependence of D* vs. distance from the silicon wall. A non-trivial time dependence extending over tens of hours is observed for all the models tested.

UR - https://www.scopus.com/pages/publications/0032592594

M3 - Conference article

AN - SCOPUS:0032592594

SN - 0272-9172

VL - 543

SP - 151

EP - 156

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the 1998 MRS Fall Meeting - The Symposium 'Advanced Catalytic Materials-1998'

Y2 - 30 November 1998 through 3 December 1998

ER -

Depth and time dependence of polystyrene chain diffusion near the polystyrene/silicon interface

Abstract

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