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Development of a tunable high repetition rate XUV source for time-resolved photoemission studies of ultrafast dynamics at surfaces

  • Stony Brook University
  • Brookhaven National Laboratory

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

7 Scopus citations

Abstract

The characterization of surfaces using photoelectron spectroscopy or photoemission electron microscopy provides sensitive probes of surface structure and electronic properties. Conventional extreme ultraviolet (XUV) light sources used for photoemission do not have ultrafast time resolution, which inhibits applying these techniques to the study of surface dynamics on their natural time scale. The high harmonics (HHG) of intense femtosecond laser pulses are capable of providing ultrashort XUV pulses for photoemission. However, for pulse-based photoemission measurements it is necessary to limit the density of electrons emitted by each pulse to prevent detrimental spacecharge effects. Therefore, to maintain reasonable data acquisition rates, the pulses must occur at a high repetition rate. Since the HHG process requires high peak fundamental laser powers, repetition rates have typically been limited to well below 1 MHz. In our lab, we can perform time-resolved XUV photoemission experiments at an 87 MHz repetition rate using a cavity-enhanced HHG source. Harmonics are generated at 87 MHz by resonantly enhancing a Yb:fiber laser capable of 1 μJ pulses in a passive optical cavity to pulse energies > 100 μJ. Average photon fluxes of up to 7x1011 photons/s in a single isolated harmonic are delivered to a surface science end station. This delivered flux and repetition rate are comparable to a synchrotron light source, but with pulse durations nearly 1000 times shorter. In this paper, we discuss critical details of the source and its performance.

Original languageEnglish
Title of host publicationLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIII
EditorsCostas P. Grigoropoulos, Beat Neuenschwander, Tetsuya Makimura, Gediminas Raciukaitis
PublisherSPIE
ISBN (Electronic)9781510615236
DOIs
StatePublished - 2018
EventLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIII 2018 - San Francisco, United States
Duration: Jan 29 2018Jan 31 2018

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10519
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIII 2018
Country/TerritoryUnited States
CitySan Francisco
Period01/29/1801/31/18

Keywords

  • High-order harmonic generation
  • High-repetition rate
  • Photoelectron spectroscopy

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