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Dislocation characterization in 4H-SiC crystals

  • J. J. Sumakeris
  • , R. T. Leonard
  • , E. Deyneka
  • , Y. Khlebnikov
  • , A. R. Powell
  • , J. Seaman
  • , M. J. Paisley
  • , V. Tsvetkov
  • , J. Guo
  • , Y. Yang
  • , M. Dudley
  • , E. Balkas
  • Wolfspeed, Inc.
  • Stony Brook University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

14 Scopus citations

Abstract

Definitive correlations are presented between specific types of dislocations identified via Synchrotron X-Ray Topography (SXRT) and identified via selective etching of 4H-SiC substrates. A variety of etch conditions and the results on different faces of SiC substrates and epiwafers are examined. Hillocks formed on the carbon face of the substrate after KOH etching correlate very well to Threading Screw Dislocations (TSDs) identified via SXRT. Topography of substrates and of vertical crystal slices reveals a large proportion of Threading Mixed character Dislocations (TMDs) in the population of TSDs.

Original languageEnglish
Title of host publicationSilicon Carbide and Related Materials 2015
EditorsFabrizio Roccaforte, Filippo Giannazzo, Francesco La Via, Roberta Nipoti, Danilo Crippa, Mario Saggio
PublisherTrans Tech Publications Ltd
Pages393-396
Number of pages4
ISBN (Print)9783035710427
DOIs
StatePublished - 2016
Event16th International Conference on Silicon Carbide and Related Materials, ICSCRM 2015 - Sicily, Italy
Duration: Oct 4 2015Oct 9 2015

Publication series

NameMaterials Science Forum
Volume858
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Conference

Conference16th International Conference on Silicon Carbide and Related Materials, ICSCRM 2015
Country/TerritoryItaly
CitySicily
Period10/4/1510/9/15

Keywords

  • Dislocations
  • Hillocks
  • Selective etching
  • Threading dislocations
  • Threading mixed character dislocations’
  • Topography

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