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Dynamical system regularized object positioning from diffraction movie

  • Yaocheng Tian
  • , Boyu Zhang
  • , Diptiman Kundu
  • , Difei Zhang
  • , Zirui Gao
  • , Ajith Pattammattel
  • , Xiaoyin Zheng
  • , Yichen Gan
  • , Varun Kankanallu
  • , Yu Chen Karen Chen-Wiegart
  • , Hanfei Yan
  • , Chris Jacobsen
  • , Horacio D. Espinosa
  • , George Barbastathis
  • Massachusetts Institute of Technology
  • Northwestern University
  • Brookhaven National Laboratory
  • Stony Brook University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We present a coupled nonlinear optimization framework that combines a physics-based dynamical model K with an optical propagation model H to perform dynamic low-dose characterization directly from time-resolved diffraction data. By embedding the equations of motion within the optical forward operator, we allow for mutual regularization between imaging and dynamics. The method converts the inverse imaging problem into a parameter-estimation task, thereby avoiding frame-by-frame phase retrieval and suppressing ill-conditionedness arising from noisy data. The approach is validated on synchrotron X-ray movies of a thermally actuated microelectro-mechanical (MEMS) oscillator. At a photon dose of ≈ 4 photons per pixel per frame, it simultaneously reconstructs the shuttle edge profile, partially coherent probe modes, and their temporal occupancies. With an incident flux of ≈ 0.015 photons per pixel per frame, the framework still recovers the MEMS shuttle displacement trajectory. Compared with conventional two-step pipelines, the joint treatment yields improved noise robustness by exploiting temporal correlations and enforcing physically admissible motion.

Original languageEnglish
Title of host publicationOptical Measurement Systems for Industrial Inspection XIV
EditorsPeter Lehmann, Wolfgang Osten, Armando Albertazzi Goncalves
PublisherSPIE
ISBN (Electronic)9781510690424
DOIs
StatePublished - Aug 8 2025
Event14th Optical Measurement Systems for Industrial Inspection - Munich, Germany
Duration: Jun 23 2025Jun 27 2025

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume13567
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference14th Optical Measurement Systems for Industrial Inspection
Country/TerritoryGermany
CityMunich
Period06/23/2506/27/25

Keywords

  • X-ray diffraction
  • inverse problem
  • low-dose metrology

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