Abstract
The decomposition and oxidation reactions of CH3OH over metallic Cu(100) and Cu2O-covered Cu(100) surfaces are studied by using a combination of in situ ambient-pressure X-ray photoelectron spectroscopy, Auger electron spectroscopy, and density functional theory calculations. We identify the sequential chemical transformation pathways from bond cleavage to the formation of intermediates and final products under operational conditions. Accumulative surface adsorption of CH3O species on metallic Cu(100) impedes the decomposition of CH3OH. Co-dosing on metallic Cu(100) with low pressures of 1 × 10-4 Torr CH3OH + 1 × 10-4 Torr O2 results in partial oxidation of CH3OH, where the chemisorbed Oads reduces surface sites available for CH3O adsorption, decreasing the surface activity for CH3OH decomposition. In contrast, the Cu2O overlayer formed under the elevated pressures of 0.33 Torr CH3OH + 0.66 Torr O2 promotes the total oxidation of CH3OH into the final products of CO2 and H2O, arising from the active reaction between lattice O within Cu2O and intermediates of CH3O, CH2O, HCOO, and CO. Despite the more favorable O-H bond scission, C-O bond scission also occurs to result in surface accumulation of CHx on metallic Cu(100), blocking active sites for decomposition reactions of CH3OH and CH3O. By comparison, the CHx species on the Cu2O-covered Cu(100) undergo oxidation into CO2 and H2O with lattice O in the Cu2O overlayer, thereby freeing active sites for the total oxidation of CH3OH. These results highlight the distinct roles of metallic Cu and Cu2O in the pathways of CH3OH decomposition and oxidation reactions, offering practical insights for the design of Cu-based catalysts with tailored reactivity and selectivity.
| Original language | English |
|---|---|
| Pages (from-to) | 4559-4572 |
| Number of pages | 14 |
| Journal | Journal of Physical Chemistry C |
| Volume | 128 |
| Issue number | 11 |
| DOIs | |
| State | Published - Mar 21 2024 |
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