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Effects of vacuum plasma spray processing parameters on splat morphology

  • G. Montavon
  • , S. Sampath
  • , C. C. Berndt
  • , H. Herman
  • , C. Coddet
  • Université de technologie de Belfort Montbéliard
  • Stony Brook University

Research output: Contribution to journalArticlepeer-review

45 Scopus citations

Abstract

Several statistical tools (i.e., Gaussian and Weibull distribution analyses, the t-test, and analysis of the variance) were used to examine relationships between vacuum plasma spray processing parameters and the morphology of flattened particles (splats) on a smooth, polished substrate. Astroloy, a nickel-base powder, was vacuum plasma sprayed onto polished copper substrates under various processing conditions. Different flattened particle shape factors, including equivalent diameter, elongation factor, and degree of splashing, were determined using image analysis. The spray parameters (i.e., current intensity, chamber pressure, argon mass flow rate, etc.) strongly influenced splat formation and morphology and thus deposit microstructure and properties.

Original languageEnglish
Pages (from-to)67-74
Number of pages8
JournalJournal of Thermal Spray Technology
Volume4
Issue number1
DOIs
StatePublished - Mar 1995

Keywords

  • flattened particle
  • image analysis
  • processing parameter
  • statistical analysis
  • vacuum plasma spraying

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