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Evaluation of model for determining nitrogen doping concentration from resultant strain in heavily doped 4H-SiC crystals

  • Stony Brook University
  • CVD Equipment Corporation

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Significant strain in 4H-SÌC substrates can be introduced by impurity incorporation in heavily doped 4H-SÌC crystals. The nondestructive X-ray double-crystal contour mapping method we reported recently is a powerful tool to estimate the lattice strain levels in 4H-SÌC substrates with different doping concentrations. The lattice strain maps were derived from 11-20, 1-100 and 0008 reflections. Result shows that lattice strains within the basal plane and along the [0001] direction are in the order of 10"J and IO' respectively. Hall effect measurements performed to determine the doping concentration of 4H-SÌC substrates show an increase in doping concentration with the decrease of contact resistivity. X-ray rocking curve measurements were employed to confirm the existence of significant lattice distortion in heavily doped 4H-SÌC substrates, which is in good agreement with the lattice strain analysis based on X-ray contour mapping method.

Original languageEnglish
Title of host publicationECS Transactions
EditorsM. Dudley, M. Bakowski, K. Shenai, N. Ohtani, B. Raghothamachar
PublisherElectrochemical Society Inc.
Pages53-61
Number of pages9
Edition12
ISBN (Electronic)9781607688594
ISBN (Print)9781510871724
DOIs
StatePublished - 2018
EventSymposium on Gallium Nitride and Silicon Carbide Power Technologies 8 - AiMES 2018, ECS and SMEQ Joint International Meeting - Cancun, Mexico
Duration: Sep 30 2018Oct 4 2018

Publication series

NameECS Transactions
Number12
Volume86
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

ConferenceSymposium on Gallium Nitride and Silicon Carbide Power Technologies 8 - AiMES 2018, ECS and SMEQ Joint International Meeting
Country/TerritoryMexico
CityCancun
Period09/30/1810/4/18

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