Evaluation of the effect of surface roughness on thin film thickness measurements using variable angle XPS

Y. L. Yan; M. A. Helfand; C. R. Clayton

doi:10.1016/0169-4332(89)90500-X

Evaluation of the effect of surface roughness on thin film thickness measurements using variable angle XPS

Y. L. Yan
, M. A. Helfand
, C. R. Clayton

Materials Science and Engineering

Stony Brook University

Research output: Contribution to journal › Article › peer-review

78 Scopus citations

Abstract

The effects of specimen surface roughness of XPS peak intensities can be experimentally observed by using the variable angle X-ray photoelectron spectroscopy (VAXPS) technique. Surface topography can be qualitatively revealed by calculating the film thickness of ultra-thin overlayer/substrate systems over a wide range of take-off angles. Results are presented for two systems, Al₂O₃/Al and SiO₂/Si. Critical angles corresponding to differing levels of surface roughness are defined to ensure accurate quantitative analysis.

Original language	English
Pages (from-to)	395-405
Number of pages	11
Journal	Applied Surface Science
Volume	37
Issue number	4
DOIs	https://doi.org/10.1016/0169-4332(89)90500-X
State	Published - Aug 1989

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title = "Evaluation of the effect of surface roughness on thin film thickness measurements using variable angle XPS",

abstract = "The effects of specimen surface roughness of XPS peak intensities can be experimentally observed by using the variable angle X-ray photoelectron spectroscopy (VAXPS) technique. Surface topography can be qualitatively revealed by calculating the film thickness of ultra-thin overlayer/substrate systems over a wide range of take-off angles. Results are presented for two systems, Al2O3/Al and SiO2/Si. Critical angles corresponding to differing levels of surface roughness are defined to ensure accurate quantitative analysis.",

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AU - Yan, Y. L.

AU - Helfand, M. A.

AU - Clayton, C. R.

PY - 1989/8

Y1 - 1989/8

N2 - The effects of specimen surface roughness of XPS peak intensities can be experimentally observed by using the variable angle X-ray photoelectron spectroscopy (VAXPS) technique. Surface topography can be qualitatively revealed by calculating the film thickness of ultra-thin overlayer/substrate systems over a wide range of take-off angles. Results are presented for two systems, Al2O3/Al and SiO2/Si. Critical angles corresponding to differing levels of surface roughness are defined to ensure accurate quantitative analysis.

AB - The effects of specimen surface roughness of XPS peak intensities can be experimentally observed by using the variable angle X-ray photoelectron spectroscopy (VAXPS) technique. Surface topography can be qualitatively revealed by calculating the film thickness of ultra-thin overlayer/substrate systems over a wide range of take-off angles. Results are presented for two systems, Al2O3/Al and SiO2/Si. Critical angles corresponding to differing levels of surface roughness are defined to ensure accurate quantitative analysis.

UR - https://www.scopus.com/pages/publications/0024716023

U2 - 10.1016/0169-4332(89)90500-X

DO - 10.1016/0169-4332(89)90500-X

M3 - Article

AN - SCOPUS:0024716023

SN - 0169-4332

VL - 37

SP - 395

EP - 405

JO - Applied Surface Science

JF - Applied Surface Science

IS - 4

ER -

Evaluation of the effect of surface roughness on thin film thickness measurements using variable angle XPS

Abstract

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