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Focused ion beam/lift-out transmission electron microscopy cross sections of block copolymer films ordered on silicon substrates

  • H. White
  • , Y. Pu
  • , M. Rafailovich
  • , J. Sokolov
  • , A. H. King
  • , L. A. Giannuzzi
  • , C. Urbanik-Shannon
  • , B. W. Kempshall
  • , A. Eisenberg
  • , S. A. Schwarz
  • , Y. M. Strzhemechny
  • Stony Brook University
  • Purdue University
  • University of Central Florida
  • McGill University
  • City University of New York

Research output: Contribution to journalArticlepeer-review

51 Scopus citations

Abstract

Thin poly(styrene210-b-2-vinylpyridine200) and poly(2-vinylpyridine94-b-styrene760-b-2-vinylpyridine94) films spun cast on silicon and annealed at 180°C for 3 days were directly cross sectioned in less than 1 h using the focused ion beam (FIB) lift-out technique. We show that with the FIB procedure, it is possible to produce cross sections that reveal structure near the silicon interface and hence the surface induced phase transitions could be examined and compared quantitatively with theoretical models. Atomic force microscopy, dynamic secondary ion mass spectrometry, and transmission electron microscopy were used to characterize the films. (C) 2000 Elsevier Science Ltd.

Original languageEnglish
Pages (from-to)1613-1619
Number of pages7
JournalPolymer
Volume42
Issue number4
DOIs
StatePublished - 2001

Keywords

  • Block copolymer
  • Focus ion beam/lift-out
  • Transmission electron microscopy

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