Gallium nitride nanowires: Polar surface controlled growth, ohmic contact patterning by focused ion beam induced direct Pt deposition and disorder effects; variable range hopping, and resonant electromechanical properties

Gallium nitride (GaN) nanowires (NW) and various nanostructures were grown by thermal reaction of gallium oxide and ammonia. The interplay between Ga/N reactant ratio and characteristic lengths of polar surfaces explained morphology variation. Field effect transistors were patterned on 40-185 nm diameter NWs by Ga⁺ focused ion beam (FIB) direct Pt deposition. The devices exhibited no gate responses with liner I-V for "small" diameter NWs. Linear I-V was unexpected since Pt forms Schottky barriers on n-GaN. I-V-T characteristics of the FIB-Pt contacts evolved from ohmic to rectifying with increasing NW diameter with strongly nonmetallic T-dependence. For small diameters, two-dimensional variable range hopping explained the contact conduction, the disorder being associated with ion-beam-induced sputtering and amorphization in the GaN under the FIB-Pt, as corroborated by transmission electron microscopy (TEM). For large diameters, back-to-back Schottky barriers explained the nonlinear I-V. High carrier concentration was confirmed explaining the absence of gate responses. Finally, Young's modulus E and quality factor Q of GaN NW were measured using in-situ TEM electromechanical resonance analysis. For large diameters, E was -300 GPa but decreased for smaller diameters. Q was greater than was obtained from micromachined Si resonators with comparable surface-tovolume ratio, implying significant advantages of GaN NW for nanoelectromechanical applications.