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High quality AlN single crystal substrates for AlGaN-based devices

  • Rafael Dalmau
  • , H. Spalding Craft
  • , Jeffrey Britt
  • , Elizabeth Paisley
  • , Baxter Moody
  • , Jianqiu Guo
  • , Yeonjae Ji
  • , Balaji Raghothamachar
  • , Michael Dudley
  • , Raoul Schlesser
  • Hexatech Inc.
  • Stony Brook University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

30 Scopus citations

Abstract

Aluminum nitride (AlN) single crystal boules were grown by physical vapor transport (PVT). Diameter expansion during boule growth, without the introduction of low angle grain boundaries (LAGB) around the boule periphery, was confirmed by crossed polarizer imaging, synchrotron white beam x-ray topography (SWBXT), and synchrotron monochromatic beam x-ray topography (SMBXT). The densities of basal plane dislocations (BPD) and threading edge dislocations (TED) averaged from high-magnification topographs of five regions of a high-quality substrate were 0 cm-2 and 992 cm-2, respectively. Substrates fabricated from AlN boules possessed excellent surface finishes suitable for epitaxy.

Original languageEnglish
Title of host publicationSilicon Carbide and Related Materials, 2017
EditorsRobert Stahlbush, Philip Neudeck, Anup Bhalla, Robert P. Devaty, Michael Dudley, Aivars Lelis
PublisherTrans Tech Publications Ltd
Pages923-926
Number of pages4
ISBN (Print)9783035711455
DOIs
StatePublished - 2018
EventInternational Conference on Silicon Carbide and Related Materials, ICSCRM 2017 - Columbia, United States
Duration: Sep 17 2017Sep 22 2017

Publication series

NameMaterials Science Forum
Volume924 MSF
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Conference

ConferenceInternational Conference on Silicon Carbide and Related Materials, ICSCRM 2017
Country/TerritoryUnited States
CityColumbia
Period09/17/1709/22/17

Keywords

  • Aluminum nitride
  • Dislocations
  • Low angle grain boundaries
  • Physical vapor transport
  • Single crystal
  • X-ray topography

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