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High throughput laser assisted near-field nanomanufacturing

  • Heng Pan
  • , David Hwang
  • , Seung H. Ko
  • , Costas P. Grigoropoulos
  • University of California at Berkeley

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Near field nanomanufacturing can break the diffraction limitation and generate features at nanoscale. However, current near field nanomanufacturing suffers from the low throughput and hinders its practical applications. In this paper, we are presenting a new approach of adopting a near-field lens array and generate an array of features with nanoscale resolution.

Original languageEnglish
Title of host publicationICALEO 2009 - 28th International Congress on Applications of Lasers and Electro-Optics, Congress Proceedings
PublisherLaser Institute of America
Pages1315-1318
Number of pages4
ISBN (Print)9780912035598
DOIs
StatePublished - 2009
Event28th International Congress on Applications of Lasers and Electro-Optics, ICALEO 2009 - Orlando, FL, United States
Duration: Nov 2 2009Nov 5 2009

Publication series

NameICALEO 2009 - 28th International Congress on Applications of Lasers and Electro-Optics, Congress Proceedings
Volume102

Conference

Conference28th International Congress on Applications of Lasers and Electro-Optics, ICALEO 2009
Country/TerritoryUnited States
CityOrlando, FL
Period11/2/0911/5/09

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