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Lateral growth expansion of 4H/6H-SiC m-plane pseudo fiber crystals by hot wall CVD epitaxy

  • NASA Glenn Research Center

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

5 Scopus citations

Abstract

Lateral expansion of small mixed polytype 4H/6H-SiC and 6H-SiC slivers was realized by hot wall chemical vapor deposition (HWCVD). Small slivers cut from m-oriented (11̄00) SiC boule slices containing regions of 4H and 6H-SiC or just single polytype 6H-SiC were exposed to HWCVD conditions using standard silane/propane chemistry for a period of up to eight hours. The slivers exhibited approximately 1500 μm (1.5 mm) of total lateral expansion. Initial analysis by synchrotron white beam x-ray topography (SWBXT) confirms that the lateral growth was homoepitaxial, matching the polytype of the respective underlying region of the seed sliver.

Original languageEnglish
Title of host publicationSilicon Carbide and Related Materials 2011, ICSCRM 2011
EditorsRobert P. Devaty, Michael Dudley, T. Paul Chow, Philip G. Neudeck
PublisherTrans Tech Publications Ltd
Pages33-36
Number of pages4
ISBN (Print)9783037854198
DOIs
StatePublished - 2012
Event14th International Conference on Silicon Carbide and Related Materials 2011, ICSCRM 2011 - Cleveland, OH, United States
Duration: Sep 11 2011Sep 16 2011

Publication series

NameMaterials Science Forum
Volume717-720
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Conference

Conference14th International Conference on Silicon Carbide and Related Materials 2011, ICSCRM 2011
Country/TerritoryUnited States
CityCleveland, OH
Period09/11/1109/16/11

Keywords

  • A-face
  • A-plane
  • CVD
  • Epitaxy
  • Hot wall
  • M-face
  • M-plane

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