Lithographic patterning of photoreactive cell-adhesive proteins

Isaac S. Carrico; Stacey A. Maskarinec; Sarah C. Heilshorn; Marissa L. Mock; Julie C. Liu; Paul J. Nowatzki; Christian Franck; Guruswami Ravichandran; David A. Tirrell

doi:10.1021/ja070200b

Lithographic patterning of photoreactive cell-adhesive proteins

Isaac S. Carrico
, Stacey A. Maskarinec
, Sarah C. Heilshorn
, Marissa L. Mock
, Julie C. Liu
, Paul J. Nowatzki
, Christian Franck
, Guruswami Ravichandran
, David A. Tirrell

Chemistry

California Institute of Technology

Research output: Contribution to journal › Article › peer-review

110 Scopus citations

Abstract

We describe a novel, simple method for the photolithographic patterning of cell-adhesive proteins. Intrinsically photoreactive proteins are synthesized in Escherichia coli through incorporation of the non-canonical, photosensitive amino acid para-azidophenylalanine. Upon ultraviolet irradiation at 365 nm, proteins form cross-linked films with elastic moduli that can be tuned by varying the concentration of photoreactive amino acid in the expression medium. Films of these proteins can be directly patterned using standard photolithographic techniques. We demonstrate the utility of this method of protein patterning by creating stable arrays of fibroblast cells on an engineered protein "photoresist".

Original language	English
Pages (from-to)	4874-4875
Number of pages	2
Journal	Journal of the American Chemical Society
Volume	129
Issue number	16
DOIs	https://doi.org/10.1021/ja070200b
State	Published - Apr 25 2007

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10.1021/ja070200b

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title = "Lithographic patterning of photoreactive cell-adhesive proteins",

abstract = "We describe a novel, simple method for the photolithographic patterning of cell-adhesive proteins. Intrinsically photoreactive proteins are synthesized in Escherichia coli through incorporation of the non-canonical, photosensitive amino acid para-azidophenylalanine. Upon ultraviolet irradiation at 365 nm, proteins form cross-linked films with elastic moduli that can be tuned by varying the concentration of photoreactive amino acid in the expression medium. Films of these proteins can be directly patterned using standard photolithographic techniques. We demonstrate the utility of this method of protein patterning by creating stable arrays of fibroblast cells on an engineered protein {"}photoresist{"}.",

author = "Carrico, \{Isaac S.\} and Maskarinec, \{Stacey A.\} and Heilshorn, \{Sarah C.\} and Mock, \{Marissa L.\} and Liu, \{Julie C.\} and Nowatzki, \{Paul J.\} and Christian Franck and Guruswami Ravichandran and Tirrell, \{David A.\}",

year = "2007",

month = apr,

day = "25",

doi = "10.1021/ja070200b",

language = "English",

volume = "129",

pages = "4874--4875",

journal = "Journal of the American Chemical Society",

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T1 - Lithographic patterning of photoreactive cell-adhesive proteins

AU - Carrico, Isaac S.

AU - Maskarinec, Stacey A.

AU - Heilshorn, Sarah C.

AU - Mock, Marissa L.

AU - Liu, Julie C.

AU - Nowatzki, Paul J.

AU - Franck, Christian

AU - Ravichandran, Guruswami

AU - Tirrell, David A.

PY - 2007/4/25

Y1 - 2007/4/25

N2 - We describe a novel, simple method for the photolithographic patterning of cell-adhesive proteins. Intrinsically photoreactive proteins are synthesized in Escherichia coli through incorporation of the non-canonical, photosensitive amino acid para-azidophenylalanine. Upon ultraviolet irradiation at 365 nm, proteins form cross-linked films with elastic moduli that can be tuned by varying the concentration of photoreactive amino acid in the expression medium. Films of these proteins can be directly patterned using standard photolithographic techniques. We demonstrate the utility of this method of protein patterning by creating stable arrays of fibroblast cells on an engineered protein "photoresist".

AB - We describe a novel, simple method for the photolithographic patterning of cell-adhesive proteins. Intrinsically photoreactive proteins are synthesized in Escherichia coli through incorporation of the non-canonical, photosensitive amino acid para-azidophenylalanine. Upon ultraviolet irradiation at 365 nm, proteins form cross-linked films with elastic moduli that can be tuned by varying the concentration of photoreactive amino acid in the expression medium. Films of these proteins can be directly patterned using standard photolithographic techniques. We demonstrate the utility of this method of protein patterning by creating stable arrays of fibroblast cells on an engineered protein "photoresist".

UR - https://www.scopus.com/pages/publications/34247497694

U2 - 10.1021/ja070200b

DO - 10.1021/ja070200b

M3 - Article

C2 - 17397163

AN - SCOPUS:34247497694

SN - 0002-7863

VL - 129

SP - 4874

EP - 4875

JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

IS - 16

ER -

Lithographic patterning of photoreactive cell-adhesive proteins

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