Local magnetic anisotropy control in NiFe thin films via ion irradiation

S. I. Woods; S. Ingvarsson; J. R. Kirtley; H. F. Hamann; R. H. Koch

doi:10.1063/1.1498869

Local magnetic anisotropy control in NiFe thin films via ion irradiation

S. I. Woods
, S. Ingvarsson
, J. R. Kirtley
, H. F. Hamann
, R. H. Koch

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IBM

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46 Scopus citations

Abstract

A method for altering the local direction and angular dispersion of anisotropy in soft magnetic films using energetic ion irradiation is demonstrated. NiFe films 50 Å thick were irradiated with 200 keV Ar ⁺ ions to doses between 10¹³ and 10¹⁶ions/ cm², while a saturating magnetic field was applied to the samples. This annealing field defined the new anisotropy direction of the irradiated areas, and the irradiation process also led to changes in the angular dispersion of anisotropy orientation, as measured by angle-dependent remanence of magnetization. By appropriate masking of films, this technique has been used to pattern samples with small "anisotropy domains."

Original language	English
Pages (from-to)	1267-1269
Number of pages	3
Journal	Applied Physics Letters
Volume	81
Issue number	7
DOIs	https://doi.org/10.1063/1.1498869
State	Published - Aug 12 2002

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title = "Local magnetic anisotropy control in NiFe thin films via ion irradiation",

abstract = "A method for altering the local direction and angular dispersion of anisotropy in soft magnetic films using energetic ion irradiation is demonstrated. NiFe films 50 {\AA} thick were irradiated with 200 keV Ar + ions to doses between 1013 and 1016ions/ cm2, while a saturating magnetic field was applied to the samples. This annealing field defined the new anisotropy direction of the irradiated areas, and the irradiation process also led to changes in the angular dispersion of anisotropy orientation, as measured by angle-dependent remanence of magnetization. By appropriate masking of films, this technique has been used to pattern samples with small {"}anisotropy domains.{"}",

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year = "2002",

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doi = "10.1063/1.1498869",

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T1 - Local magnetic anisotropy control in NiFe thin films via ion irradiation

AU - Woods, S. I.

AU - Ingvarsson, S.

AU - Kirtley, J. R.

AU - Hamann, H. F.

AU - Koch, R. H.

PY - 2002/8/12

Y1 - 2002/8/12

N2 - A method for altering the local direction and angular dispersion of anisotropy in soft magnetic films using energetic ion irradiation is demonstrated. NiFe films 50 Å thick were irradiated with 200 keV Ar + ions to doses between 1013 and 1016ions/ cm2, while a saturating magnetic field was applied to the samples. This annealing field defined the new anisotropy direction of the irradiated areas, and the irradiation process also led to changes in the angular dispersion of anisotropy orientation, as measured by angle-dependent remanence of magnetization. By appropriate masking of films, this technique has been used to pattern samples with small "anisotropy domains."

AB - A method for altering the local direction and angular dispersion of anisotropy in soft magnetic films using energetic ion irradiation is demonstrated. NiFe films 50 Å thick were irradiated with 200 keV Ar + ions to doses between 1013 and 1016ions/ cm2, while a saturating magnetic field was applied to the samples. This annealing field defined the new anisotropy direction of the irradiated areas, and the irradiation process also led to changes in the angular dispersion of anisotropy orientation, as measured by angle-dependent remanence of magnetization. By appropriate masking of films, this technique has been used to pattern samples with small "anisotropy domains."

UR - https://www.scopus.com/pages/publications/79956057111

U2 - 10.1063/1.1498869

DO - 10.1063/1.1498869

M3 - Article

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SN - 0003-6951

VL - 81

SP - 1267

EP - 1269

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 7

ER -

Local magnetic anisotropy control in NiFe thin films via ion irradiation

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