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Local structure and bonding of luminescent Er in GaN: A contrast with Er in Si

  • Nokia
  • University of Cincinnati

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

X-ray absorption measurements from relatively high concentrations of Er (>0.1 at. percent) doped in GaN films show that Er occupies the Ga site with an unprecedentedly short Er-N bond length. Electroluminescence intensities from these GaN:Er films correlate with the concentration of Er atoms that replace Ga, not with the abundantly present O impurities in the host. Simple chemical concepts are used to explain each of these results and their striking difference from those obtained for Er-doped Si.

Original languageEnglish
Title of host publication2000 International Semiconducting and Insulating Materials Conference, SIMC 2000
EditorsN. J. Welham, C. Jagadish
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages15-22
Number of pages8
ISBN (Electronic)0780358147
DOIs
StatePublished - 2000
Event11th International Semiconducting and Insulating Materials Conference, SIMC 2000 - Canberra, Australia
Duration: Jul 3 2000Jul 7 2000

Publication series

NameIEEE Semiconducting and Semi-Insulating Materials Conference, SIMC
Volume2000-January

Conference

Conference11th International Semiconducting and Insulating Materials Conference, SIMC 2000
Country/TerritoryAustralia
CityCanberra
Period07/3/0007/7/00

Keywords

  • Atomic measurements
  • Bonding
  • Electroluminescence
  • Electromagnetic wave absorption
  • Erbium
  • Gallium nitride
  • Luminescence
  • Optical films
  • Optical sensors
  • Temperature

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