Low-density polymer thin film formation in supercritical carbon dioxide

Tadanori Koga; Y. S. Seo; J. L. Jerome; S. Ge; M. H. Rafailovich; J. C. Sokolov; B. Chu; O. H. Seeck; M. Tolan; R. Kolb

doi:10.1063/1.1629799

Low-density polymer thin film formation in supercritical carbon dioxide

Tadanori Koga
, Y. S. Seo
, J. L. Jerome
, S. Ge
, M. H. Rafailovich
, J. C. Sokolov
, B. Chu
, O. H. Seeck
, M. Tolan
, R. Kolb

Materials Science and Engineering

Stony Brook University
Jülich Research Centre
TU Dortmund University
ExxonMobil

Research output: Contribution to journal › Article › peer-review

28 Scopus citations

Abstract

Exposure to scCO₂ in the P-T range corresponding to a density fluctuation regime was used to produce uniform low-density films of approximately 2R_g or less. For films L₀≫2R_g a region of low-density, about 3R_g thickness, is produced at the surface that then decays into the bulk.

Original language	English
Pages (from-to)	4309-4311
Number of pages	3
Journal	Applied Physics Letters
Volume	83
Issue number	21
DOIs	https://doi.org/10.1063/1.1629799
State	Published - Nov 24 2003

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title = "Low-density polymer thin film formation in supercritical carbon dioxide",

abstract = "Exposure to scCO2 in the P-T range corresponding to a density fluctuation regime was used to produce uniform low-density films of approximately 2Rg or less. For films L0≫2Rg a region of low-density, about 3Rg thickness, is produced at the surface that then decays into the bulk.",

author = "Tadanori Koga and Seo, \{Y. S.\} and Jerome, \{J. L.\} and S. Ge and Rafailovich, \{M. H.\} and Sokolov, \{J. C.\} and B. Chu and Seeck, \{O. H.\} and M. Tolan and R. Kolb",

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T1 - Low-density polymer thin film formation in supercritical carbon dioxide

AU - Koga, Tadanori

AU - Seo, Y. S.

AU - Jerome, J. L.

AU - Ge, S.

AU - Rafailovich, M. H.

AU - Sokolov, J. C.

AU - Chu, B.

AU - Seeck, O. H.

AU - Tolan, M.

AU - Kolb, R.

PY - 2003/11/24

Y1 - 2003/11/24

N2 - Exposure to scCO2 in the P-T range corresponding to a density fluctuation regime was used to produce uniform low-density films of approximately 2Rg or less. For films L0≫2Rg a region of low-density, about 3Rg thickness, is produced at the surface that then decays into the bulk.

AB - Exposure to scCO2 in the P-T range corresponding to a density fluctuation regime was used to produce uniform low-density films of approximately 2Rg or less. For films L0≫2Rg a region of low-density, about 3Rg thickness, is produced at the surface that then decays into the bulk.

UR - https://www.scopus.com/pages/publications/0348107234

U2 - 10.1063/1.1629799

DO - 10.1063/1.1629799

M3 - Article

AN - SCOPUS:0348107234

SN - 0003-6951

VL - 83

SP - 4309

EP - 4311

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 21

ER -

Low-density polymer thin film formation in supercritical carbon dioxide

Abstract

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