TY - JOUR
T1 - Machine-learning for designing nanoarchitectured materials by dealloying
AU - Zhao, Chonghang
AU - Chung, Cheng Chu
AU - Jiang, Siying
AU - Noack, Marcus M.
AU - Chen, Jiun Han
AU - Manandhar, Kedar
AU - Lynch, Joshua
AU - Zhong, Hui
AU - Zhu, Wei
AU - Maffettone, Phillip
AU - Olds, Daniel
AU - Fukuto, Masafumi
AU - Takeuchi, Ichiro
AU - Ghose, Sanjit
AU - Caswell, Thomas
AU - Yager, Kevin G.
AU - Chen-Wiegart, Yu chen Karen
N1 - Publisher Copyright:
© 2022, The Author(s).
PY - 2022/12
Y1 - 2022/12
N2 - Machine learning-augmented materials design is an emerging method for rapidly developing new materials. It is especially useful for designing new nanoarchitectured materials, whose design parameter space is often large and complex. Metal-agent dealloying, a materials design method for fabricating nanoporous or nanocomposite from a wide range of elements, has attracted significant interest. Here, a machine learning approach is introduced to explore metal-agent dealloying, leading to the prediction of 132 plausible ternary dealloying systems. A machine learning-augmented framework is tested, including predicting dealloying systems and characterizing combinatorial thin films via automated and autonomous machine learning-driven synchrotron techniques. This work demonstrates the potential to utilize machine learning-augmented methods for creating nanoarchitectured thin films.
AB - Machine learning-augmented materials design is an emerging method for rapidly developing new materials. It is especially useful for designing new nanoarchitectured materials, whose design parameter space is often large and complex. Metal-agent dealloying, a materials design method for fabricating nanoporous or nanocomposite from a wide range of elements, has attracted significant interest. Here, a machine learning approach is introduced to explore metal-agent dealloying, leading to the prediction of 132 plausible ternary dealloying systems. A machine learning-augmented framework is tested, including predicting dealloying systems and characterizing combinatorial thin films via automated and autonomous machine learning-driven synchrotron techniques. This work demonstrates the potential to utilize machine learning-augmented methods for creating nanoarchitectured thin films.
UR - https://www.scopus.com/pages/publications/85141609973
U2 - 10.1038/s43246-022-00303-w
DO - 10.1038/s43246-022-00303-w
M3 - Article
AN - SCOPUS:85141609973
SN - 2662-4443
VL - 3
JO - Communications Materials
JF - Communications Materials
IS - 1
M1 - 86
ER -