Abstract
The structural and chemical character of focused-ion-beam (FIB)-deposited metal such as platinum (Pt) contacts on GaN nanowires to understand the composition and microstructure affect the electrical performance, were analyzed. Within the electron-beam-induced deposition (EBID)-Pt capping layer and ion-beam-induced deposition (IBID)-Pt contact, dark spotty contrast within a bright matrix suggested that dense Pt nanocrystallites were embedded within a low-density C matrix. On IBID-Pt-contacted GaN nanowire devices, the onset of linear current-voltage (I-V) characteristics as the nanowire diameter decreased. The results show that the IBID-Pt contacts were found to contain nanocrystalline Pt embedded in an amorphous matrix of C and Ga.
| Original language | English |
|---|---|
| Pages (from-to) | 290-294 |
| Number of pages | 5 |
| Journal | Advanced Materials |
| Volume | 18 |
| Issue number | 3 |
| DOIs | |
| State | Published - Feb 3 2006 |
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