Skip to main navigation Skip to search Skip to main content

M3: Microscope-based maskless micropatterning with dry film photoresist

  • Stony Brook University

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

We present a maskless micropatterning system that utilizes a fluorescence microscope with programmable X-Y stage and dry film photoresist to realize feature sizes in the sub-millimeter range (40-700 μThe method allows for flexible in-house maskless photolithography without a dedicated microfabrication facility and is well-suited for rapid prototyping of microfluidic channels, scaffold templates for protein/cell patterning or optically-guided cell encapsulation for biomedical applications.

Original languageEnglish
Pages (from-to)375-381
Number of pages7
JournalBiomedical Microdevices
Volume13
Issue number2
DOIs
StatePublished - Apr 2011

Keywords

  • Cell patterning
  • Dry film photoresist
  • Maskless photolithography
  • Microfluidics

Fingerprint

Dive into the research topics of 'M3: Microscope-based maskless micropatterning with dry film photoresist'. Together they form a unique fingerprint.

Cite this