Skip to main navigation Skip to search Skip to main content

Optimization of p-doping profile of 1.3-μm InGaAsP/InP MQW lasers for high-temperature operation

  • D. V. Donetsky
  • , C. L. Reynolds
  • , G. L. Belenky
  • , G. E. Shtengel
  • , R. F. Kazarinov
  • , S. Luryi
  • Stony Brook University

Research output: Contribution to conferencePaperpeer-review

1 Scopus citations

Abstract

A study was carried out to show that alignment of p-doping profile within the separate confinement heterostructure (SCH) layer allows to achieve even lower threshold current and to minimize temperature sensitivity of external efficiency. Direct measurements of optical loss devices with different doping profiles were performed. Growth, fabrication, and characterization of uncoated broad-area lasers were made.

Original languageEnglish
Pages302-303
Number of pages2
StatePublished - 1998
EventProceedings of the 1998 Conference on Lasers and Electro-Optics, CLEO - San Francisco, CA, USA
Duration: May 3 1998May 8 1998

Conference

ConferenceProceedings of the 1998 Conference on Lasers and Electro-Optics, CLEO
CitySan Francisco, CA, USA
Period05/3/9805/8/98

Fingerprint

Dive into the research topics of 'Optimization of p-doping profile of 1.3-μm InGaAsP/InP MQW lasers for high-temperature operation'. Together they form a unique fingerprint.

Cite this