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Phononic amorphous silicon: Theory, material, and devices

  • Samrat Chawda
  • , Jose Mawyin
  • , Harv Mahan
  • , Charles Fortmann
  • , Gary Halada
  • Stony Brook University
  • National Renewable Energy Laboratory

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The prospect of using phonons in amorphous silicon to convey information from one location to another is investigated. It is known that the phonon lifetime in amorphous silicon is anomalously long and the phonon diffusivity is relatively large as compared to crystal silicon and other materials. A commercial Raman spectrometer measuring from the film side operating at 785 nm was used in conjuncture with a 470 nm bias light illuminating the glass side of amorphous silicon films deposited onto glass substrates. All measurements were conducted at liquid nitrogen temperature. Analysis indicates a phonon diffusion length of a least 0.5 μm. These results directly lead to tantalizing prospects for phonon engineered amorphous silicon technology.

Original languageEnglish
Title of host publicationAmorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2006
Pages117-122
Number of pages6
StatePublished - 2007
Event2006 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 18 2006Apr 20 2006

Publication series

NameMaterials Research Society Symposium Proceedings
Volume910
ISSN (Print)0272-9172

Conference

Conference2006 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period04/18/0604/20/06

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