Photochemical breakdown of acetone on copper

Sanjay V. Kagwade; Clive R. Clayton; Devicharan Chidambaram; Gary P. Halada

doi:10.1016/S0013-4686(01)00359-0

Photochemical breakdown of acetone on copper

Sanjay V. Kagwade
, Clive R. Clayton
, Devicharan Chidambaram
, Gary P. Halada

Materials Science and Engineering

Stony Brook University

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

X-ray photoelectron spectroscopy studies have shown that acetone, when used as a cleaning agent for copper in the presence of ambient light and water vapor, slowly reacts to form acetic acid. This reaction does not occur in the absence of light. This suggests that copper acts as a photocatalyst for the reaction between acetone and water vapor. The use of acetone for degreasing copper and copper containing alloys as recommended by ASTM E1078-97 is questioned in this paper.

Original language	English
Pages (from-to)	2337-2342
Number of pages	6
Journal	Electrochimica Acta
Volume	46
Issue number	15
DOIs	https://doi.org/10.1016/S0013-4686(01)00359-0
State	Published - Apr 30 2001

Keywords

Acetate
Acetone degreasing
Copper
Photochemical
X-ray photoelectron spectroscopy

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10.1016/S0013-4686(01)00359-0

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title = "Photochemical breakdown of acetone on copper",

abstract = "X-ray photoelectron spectroscopy studies have shown that acetone, when used as a cleaning agent for copper in the presence of ambient light and water vapor, slowly reacts to form acetic acid. This reaction does not occur in the absence of light. This suggests that copper acts as a photocatalyst for the reaction between acetone and water vapor. The use of acetone for degreasing copper and copper containing alloys as recommended by ASTM E1078-97 is questioned in this paper.",

keywords = "Acetate, Acetone degreasing, Copper, Photochemical, X-ray photoelectron spectroscopy",

author = "Kagwade, \{Sanjay V.\} and Clayton, \{Clive R.\} and Devicharan Chidambaram and Halada, \{Gary P.\}",

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T1 - Photochemical breakdown of acetone on copper

AU - Kagwade, Sanjay V.

AU - Clayton, Clive R.

AU - Chidambaram, Devicharan

AU - Halada, Gary P.

PY - 2001/4/30

Y1 - 2001/4/30

N2 - X-ray photoelectron spectroscopy studies have shown that acetone, when used as a cleaning agent for copper in the presence of ambient light and water vapor, slowly reacts to form acetic acid. This reaction does not occur in the absence of light. This suggests that copper acts as a photocatalyst for the reaction between acetone and water vapor. The use of acetone for degreasing copper and copper containing alloys as recommended by ASTM E1078-97 is questioned in this paper.

AB - X-ray photoelectron spectroscopy studies have shown that acetone, when used as a cleaning agent for copper in the presence of ambient light and water vapor, slowly reacts to form acetic acid. This reaction does not occur in the absence of light. This suggests that copper acts as a photocatalyst for the reaction between acetone and water vapor. The use of acetone for degreasing copper and copper containing alloys as recommended by ASTM E1078-97 is questioned in this paper.

KW - Acetate

KW - Acetone degreasing

KW - Copper

KW - Photochemical

KW - X-ray photoelectron spectroscopy

UR - https://www.scopus.com/pages/publications/0035972074

U2 - 10.1016/S0013-4686(01)00359-0

DO - 10.1016/S0013-4686(01)00359-0

M3 - Article

AN - SCOPUS:0035972074

SN - 0013-4686

VL - 46

SP - 2337

EP - 2342

JO - Electrochimica Acta

JF - Electrochimica Acta

IS - 15

ER -

Photochemical breakdown of acetone on copper

Abstract

Keywords

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