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Pressure dependence of the OH-stretching mode in F-rich natural topaz and topaz-OH

  • K. Komatsu
  • , H. Kagi
  • , T. Okada
  • , T. Kuribayashi
  • , J. B. Parise
  • , Y. Kudoh
  • Tohoku University
  • The University of Tokyo
  • The University of Osaka

Research output: Contribution to journalArticlepeer-review

23 Scopus citations

Abstract

OH stretching vibration modes for F-rich natural topaz (F-topaz) and for fully hydrated topaz (topaz-OH) synthesized at high pressure, were observed using IR and Raman spectroscopies at pressures up to 30.4 GPa and 17.3 GPa, respectively. In F-topaz, the pressure derivative of the frequency of the OH stretching band observed at 3650 cm-1 at ambient pressure was 0.91(3) cm-1/GPa, which was consistent with the value recently reported by Bradbury and Williams (2003). On the other hand, in topaz-OH, the pressure derivatives of the bands initially at 3599 and 3522 cm-1 were -5.2(2) and -2.56(6) cm -1/GPa, respectively. This contrasting behavior between the two forms of topaz at high pressures suggests that the OH substitution for F in topaz affects the hydrogen-bonding behavior under high pressure.

Original languageEnglish
Pages (from-to)266-270
Number of pages5
JournalAmerican Mineralogist
Volume90
Issue number1
DOIs
StatePublished - Jan 2005

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