TY - GEN
T1 - Projection x-ray topography system at 1-BM x-ray optics test beamline at the advanced photon source
AU - Stoupin, Stanislav
AU - Raghothamachar, Balaji
AU - Dudley, Michael
AU - Liu, Zunping
AU - Trakhtenberg, Emil
AU - Lang, Keenan
AU - Goetze, Kurt
AU - Sullivan, Joseph
AU - Macrander, Albert
N1 - Publisher Copyright:
© 2016 Author(s).
PY - 2016/7/27
Y1 - 2016/7/27
N2 - Projection X-ray topography of single crystals is a classic technique for the evaluation of intrinsic crystal quality of large crystals. In this technique a crystal sample and an area detector (e.g., X-ray film) collecting intensity of a chosen crystallographic reflection are translated simultaneously across an X-ray beam collimated in the diffraction scattering plane (e.g., [1, 2]). A bending magnet beamline of a third-generation synchrotron source delivering x-ray beam with a large horizontal divergence, and therefore, a large horizontal beam size at a crystal sample position offers an opportunity to obtain X-ray topographs of large crystalline samples (e.g., 6-inch wafers) in just a few exposures. Here we report projection X-ray topography system implemented recently at 1-BM beamline of the Advanced Photon Source. A selected X-ray topograph of a 6-inch wafer of 4H-SiC illustrates capabilities and limitations of the technique.
AB - Projection X-ray topography of single crystals is a classic technique for the evaluation of intrinsic crystal quality of large crystals. In this technique a crystal sample and an area detector (e.g., X-ray film) collecting intensity of a chosen crystallographic reflection are translated simultaneously across an X-ray beam collimated in the diffraction scattering plane (e.g., [1, 2]). A bending magnet beamline of a third-generation synchrotron source delivering x-ray beam with a large horizontal divergence, and therefore, a large horizontal beam size at a crystal sample position offers an opportunity to obtain X-ray topographs of large crystalline samples (e.g., 6-inch wafers) in just a few exposures. Here we report projection X-ray topography system implemented recently at 1-BM beamline of the Advanced Photon Source. A selected X-ray topograph of a 6-inch wafer of 4H-SiC illustrates capabilities and limitations of the technique.
UR - https://www.scopus.com/pages/publications/84984548862
U2 - 10.1063/1.4952938
DO - 10.1063/1.4952938
M3 - Conference contribution
AN - SCOPUS:84984548862
T3 - AIP Conference Proceedings
BT - Proceedings of the 12th International Conference on Synchrotron Radiation Instrumentation, SRI 2015
A2 - Chubar, Oleg
A2 - Jarrige, Ignace
A2 - Kaznatcheev, Konstantine
A2 - Miller, Lisa
A2 - Stavitski, Eli
A2 - Tanabe, Toshiya
A2 - Shaftan, Timur
A2 - Shen, Qun
A2 - Pindak, Ronald
A2 - Nelson, Christie
A2 - Kalbfleisch, Sebastian
A2 - Thieme, Juergen
A2 - Williams, Garth
A2 - Fuchs, Martin
A2 - Rumaiz, Abdul
A2 - Wang, Jun
A2 - Evans-Lutterodt, Kenneth
A2 - Lee, Wah-Keat
A2 - McSweeney, Sean
A2 - Vescovo, Elio
PB - American Institute of Physics Inc.
T2 - 12th International Conference on Synchrotron Radiation Instrumentation, SRI 2015
Y2 - 6 July 2015 through 10 July 2015
ER -