Solvent-free bottom-up patterning of zeolitic imidazolate frameworks

Yurun Miao; Dennis T. Lee; Matheus Dorneles de Mello; Mueed Ahmad; Mohammed K. Abdel-Rahman; Patrick M. Eckhert; J. Anibal Boscoboinik; D. Howard Fairbrother; Michael Tsapatsis

doi:10.1038/s41467-022-28050-z

Solvent-free bottom-up patterning of zeolitic imidazolate frameworks

Yurun Miao
, Dennis T. Lee
, Matheus Dorneles de Mello
, Mueed Ahmad
, Mohammed K. Abdel-Rahman
, Patrick M. Eckhert
, J. Anibal Boscoboinik
, D. Howard Fairbrother
, Michael Tsapatsis

Materials Science and Engineering

Johns Hopkins University
Brookhaven National Laboratory
University of Delaware
Stony Brook University
Johns Hopkins University Applied Physics Laboratory

Research output: Contribution to journal › Article › peer-review

42 Scopus citations

Abstract

Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.

Original language	English
Article number	420
Journal	Nature Communications
Volume	13
Issue number	1
DOIs	https://doi.org/10.1038/s41467-022-28050-z
State	Published - Dec 2022

Access to Document

10.1038/s41467-022-28050-z

Cite this

@article{393264109bdd46c98120245b8837a117,

title = "Solvent-free bottom-up patterning of zeolitic imidazolate frameworks",

abstract = "Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.",

author = "Yurun Miao and Lee, \{Dennis T.\} and \{de Mello\}, \{Matheus Dorneles\} and Mueed Ahmad and Abdel-Rahman, \{Mohammed K.\} and Eckhert, \{Patrick M.\} and Boscoboinik, \{J. Anibal\} and Fairbrother, \{D. Howard\} and Michael Tsapatsis",

note = "Publisher Copyright: {\textcopyright} 2022, The Author(s).",

year = "2022",

month = dec,

doi = "10.1038/s41467-022-28050-z",

language = "English",

volume = "13",

journal = "Nature Communications",

issn = "2041-1723",

number = "1",

}

TY - JOUR

T1 - Solvent-free bottom-up patterning of zeolitic imidazolate frameworks

AU - Miao, Yurun

AU - Lee, Dennis T.

AU - de Mello, Matheus Dorneles

AU - Ahmad, Mueed

AU - Abdel-Rahman, Mohammed K.

AU - Eckhert, Patrick M.

AU - Boscoboinik, J. Anibal

AU - Fairbrother, D. Howard

AU - Tsapatsis, Michael

PY - 2022/12

Y1 - 2022/12

N2 - Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.

AB - Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.

UR - https://www.scopus.com/pages/publications/85123251971

U2 - 10.1038/s41467-022-28050-z

DO - 10.1038/s41467-022-28050-z

M3 - Article

C2 - 35058452

AN - SCOPUS:85123251971

SN - 2041-1723

VL - 13

JO - Nature Communications

JF - Nature Communications

IS - 1

M1 - 420

ER -

Solvent-free bottom-up patterning of zeolitic imidazolate frameworks

Abstract

Access to Document

Other files and links

Fingerprint

Cite this