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Stacking fault analysis for the early-stages of PVT growth of 4H-SiC crystals

  • Stony Brook University
  • Brookhaven National Laboratory Condensed Matter Physics and Materials Science Department

Research output: Contribution to journalArticlepeer-review

Abstract

Four types of stacking fault formation mechanisms are identified and discussed for early stage PVT growth of 4H-SiC crystals: Type 1: Shockley / double Shockley stacking fault formation inside the facet; Type 2: Stacking fault formation via 2D nucleation; Type 3: Frank + Shockley (S) stacking fault formation due to deflection of threading mixed dislocation (TMD) by macrosteps; Type 4: “Carrot” defect formation related to overgrowth of the terrace formed by separation of 3c/4 and c/4 step risers after deflection of a TMD by vicinal steps. The results help further reduction of defect generation in 4H-SiC substrates.

Original languageEnglish
Article number128523
JournalJournal of Crystal Growth
Volume681
DOIs
StatePublished - Apr 15 2026

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