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Synchrotron X-ray topographic image contrast variation of screw-type basal plane dislocations located at different depths below the crystal surface in 4H-SiC

  • Fumihiro Fujie
  • , Hongyu Peng
  • , Tuerxun Ailihumaer
  • , Balaji Raghothamachar
  • , Michael Dudley
  • , Shunta Harada
  • , Miho Tagawa
  • , Toru Ujihara
  • Nagoya University
  • Stony Brook University

Research output: Contribution to journalArticlepeer-review

23 Scopus citations

Abstract

The contrast features of synchrotron X-ray topographic images of screw-type basal plane dislocations (BPDs) in on-axis 4H-SiC wafers have been studied. Screw BPD images are categorized into two types: one exhibiting a white line bordered by black lines and the other a pure black line contrast. Similar images for off-axis specimens and the corresponding ray-tracing simulations demonstrate that these contrasts can be attributed to the depth of the screw BPDs below the crystal surface. The correlation of the contrast features between simulations and the screw BPD topography images can be used to estimate the depth.

Original languageEnglish
Article number116746
JournalActa Materialia
Volume208
DOIs
StatePublished - Apr 15 2021

Keywords

  • Dislocations
  • Silicon carbide
  • Simulation
  • Synchrotron X-ray topography

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