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The penetrability of a thin metallic film inside the RF field

  • Yongxiang Zhao
  • , Ilan Ben-Zvi
  • , Xiangyun Chang
  • , Triveni Rao
  • , Wei Chen
  • , Robert Di Nardo
  • , Rolf Beuttenmuller
  • Brookhaven National Laboratory

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

Thin metallic film was widely applied in various areas. Especially, recently we are planning to apply it in a "Secondary emission enhanced photo-injector", in which a diamond cathode is coated with a metallic film on its back to serve as a current path. The thickness of the film is originally considered to be in the order of 10 nm, which is much less than the skin depth, by a factor of almost 200. One would think intuitively that the RF filed would penetrate such a thin film. However, we found it is not true. The film will block most of the field. This paper addresses theoretical analysis as well as the experimental results, and demonstrates that the penetrability of a thin film is very poor. Consequently, most of the RF current will flow on the thin film causing a serious heating problem.

Original languageEnglish
Title of host publicationProceedings of the Particle Accelerator Conference, PAC 2005
Pages3073-3075
Number of pages3
DOIs
StatePublished - 2005
EventParticle Accelerator Conference, PAC 2005 - Knoxville, TN, United States
Duration: May 16 2005May 20 2005

Publication series

NameProceedings of the IEEE Particle Accelerator Conference
Volume2005

Conference

ConferenceParticle Accelerator Conference, PAC 2005
Country/TerritoryUnited States
CityKnoxville, TN
Period05/16/0505/20/05

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