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Theoretical and experimental comparison of optimized doping profiles for high-performance InP Gunn devices at 220-500 GHz

  • University of Leeds

Research output: Contribution to journalConference articlepeer-review

3 Scopus citations

Abstract

Different types of doping profiles are investigated theoretically and experimentally for their potential of improving the performance of InP Gunn devices at J-band (220-325 GHz) frequencies and above. As initial experimental results, devices with an optimized graded doping profile generated output power levels approximately twice the previous state-of-the-art values at 280-300 GHz. Simulations identified a flat doping profile with a notch at the cathode as even more promising. For example, an RF output power of 50 mW at 240 GHz is predicted for this profile compared to 42 m W at 240 GHz from an optimized graded doping profile.

Original languageEnglish
Pages (from-to)907-910
Number of pages4
JournalIEEE MTT-S International Microwave Symposium Digest
Volume2
StatePublished - 2003
Event2003 IEEE MTT-S International Microwave Symposium Digest - Philadelphia, PA, United States
Duration: Jun 8 2003Jun 13 2003

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