Abstract
Different types of doping profiles are investigated theoretically and experimentally for their potential of improving the performance of InP Gunn devices at J-band (220-325 GHz) frequencies and above. As initial experimental results, devices with an optimized graded doping profile generated output power levels approximately twice the previous state-of-the-art values at 280-300 GHz. Simulations identified a flat doping profile with a notch at the cathode as even more promising. For example, an RF output power of 50 mW at 240 GHz is predicted for this profile compared to 42 m W at 240 GHz from an optimized graded doping profile.
| Original language | English |
|---|---|
| Pages (from-to) | 907-910 |
| Number of pages | 4 |
| Journal | IEEE MTT-S International Microwave Symposium Digest |
| Volume | 2 |
| State | Published - 2003 |
| Event | 2003 IEEE MTT-S International Microwave Symposium Digest - Philadelphia, PA, United States Duration: Jun 8 2003 → Jun 13 2003 |
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