Abstract
Pulsed laser induced recrystallization of amorphous silicon films was analyzed. It was found that the recrystallized material structure depends upon the laser fluence and the melt quench rate. The dynamics of the rapid phase transformation were probed by ultrafast pump and probe imaging and reflectivity measurement. The time delay between the main pump and the probe beams was adjusted by a precision translation stage coupled with a fiber optics assembly.
| Original language | English |
|---|---|
| Pages | 231-232 |
| Number of pages | 2 |
| State | Published - 2001 |
| Event | Conference on Lasers and Electro-Optics (CLEO) - Baltimore, MD, United States Duration: May 6 2001 → May 11 2001 |
Conference
| Conference | Conference on Lasers and Electro-Optics (CLEO) |
|---|---|
| Country/Territory | United States |
| City | Baltimore, MD |
| Period | 05/6/01 → 05/11/01 |
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