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Ultra-fast laser-induced recrystallization of amorphous silicon films

  • University of California at Berkeley

Research output: Contribution to conferencePaperpeer-review

Abstract

Pulsed laser induced recrystallization of amorphous silicon films was analyzed. It was found that the recrystallized material structure depends upon the laser fluence and the melt quench rate. The dynamics of the rapid phase transformation were probed by ultrafast pump and probe imaging and reflectivity measurement. The time delay between the main pump and the probe beams was adjusted by a precision translation stage coupled with a fiber optics assembly.

Original languageEnglish
Pages231-232
Number of pages2
StatePublished - 2001
EventConference on Lasers and Electro-Optics (CLEO) - Baltimore, MD, United States
Duration: May 6 2001May 11 2001

Conference

ConferenceConference on Lasers and Electro-Optics (CLEO)
Country/TerritoryUnited States
CityBaltimore, MD
Period05/6/0105/11/01

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