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X-ray diffraction measurement of doping induced lattice mismatch in n-type 4H-SiC epilayers grown on p-type substrates

  • NASA Glenn Research Center
  • CAMET Research, Inc.
  • Stony Brook University

Research output: Contribution to journalArticlepeer-review

37 Scopus citations

Abstract

A study on x-ray diffraction measurement of doping induced lattice mismatch in n-type 4H-SiC epilayers grown on p-type substrates is presented. It was found that in single 4H-SiC, increasing the nitrogen doping level above 4 × 1017 cm-3 results in corresponding increase in lattice contraction. It was observed that significant lattice tilts exist in epilayers doped greater than 2 × 1019 cm-3.

Original languageEnglish
Pages (from-to)1971-1973
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number10
DOIs
StatePublished - Sep 8 2003

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