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X-ray topography characterization of large diameter AlN single crystal substrates

  • Rafael Dalmau
  • , Jeffrey Britt
  • , Haoyang Fang
  • , Balaji Raghothamachar
  • , Michael Dudley
  • , Raoul Schlesser
  • Hexatech Inc.
  • Stony Brook University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

17 Scopus citations

Abstract

Large diameter aluminum nitride (AlN) substrates, up to 50 mm, were manufactured from single crystal boules grown by physical vapor transport (PVT). Synchrotron-based x-ray topography (XRT) was used to characterize the density, distribution, and type of dislocations. White beam topography images acquired in transmission geometry were used to analyze basal plane dislocations (BPDs) and low angle grain boundaries (LAGBs), while monochromatic beam, grazing incidence images were used to analyze threading dislocations. Boule diameter expansion, without the introduction of LAGBs around the periphery, was shown. A 48 mm substrate with a uniform threading dislocation density below 7.0 x 102 cm-2 and a BPD of 0 cm-2, the lowest dislocation densities reported to date for an AlN single crystal this size, was demonstrated.

Original languageEnglish
Title of host publicationSilicon Carbide and Related Materials 2019
EditorsHiroshi Yano, Takeshi Ohshima, Kazuma Eto, Takeshi Mitani, Shinsuke Harada, Yasunori Tanaka
PublisherTrans Tech Publications Ltd
Pages63-68
Number of pages6
ISBN (Print)9783035715798
DOIs
StatePublished - 2020
Event18th International Conference on Silicon Carbide and Related Materials, ICSCRM 2019 - Kyoto, Japan
Duration: Sep 29 2019Oct 4 2019

Publication series

NameMaterials Science Forum
Volume1004 MSF
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Conference

Conference18th International Conference on Silicon Carbide and Related Materials, ICSCRM 2019
Country/TerritoryJapan
CityKyoto
Period09/29/1910/4/19

Keywords

  • Dislocations
  • Low angle grain boundaries
  • Physical vapor transport
  • Single crystal
  • X-ray topography

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